Mentor Graphics Calibre光掩膜数据准备工具通过45纳米工艺认证

Calibre MDP的发展是为了应对IC生产自180纳米起跨入深亚微米领域后带来的庞大的数据量。当时半导体制造商必须将解析度增强技术用于元件设计才能开发出成功的芯片，然而它所产生的数据文件却必须”flattened”以符合光掩膜读写机器的格式要求，这使得数据量爆增到每次光掩膜读写都需要数天或数周时间，所造成的瓶颈不但导致成本大幅攀升，还严重影响半导体厂商掌握市场时机的能力。

Calibre MDP可以縮小数据文件、增強流程工具的效能和功能、統一几何处理和提高处理效率，进而減少作业流程的瓶颈和加快TAT时间 (turn-around-time)。这套工具支持所有光掩膜读写机器格式：MEBES、JEOL、Toshiba/NuFlare、Hitachi和Micronic。

Calibre的光掩膜数据准备套件是领先市场的Calibre芯片设计平台的一部份，此平台包含物理验证、寄生参数提取、可制造设计 (DFM) 和解析度增强技术(RET)解決方案。Calibre平台已通过45纳米工艺验证，现在能直接用于45纳米芯片设计。

Mentor Graphics將于2月14-19日在美國加州圣何塞会议中心 (San Jose Convention Center) 举行2006 SPIE Microlithography研讨会,展出Calibre光掩膜处理流程 (展览摊位#313) 以及最新的先进光学修正 (OPC) 的验证解決方案Calibre OPCverify。

Mentor Graphics Calibre Mask Data Preparation Ready for 45nm

WILSONVILLE, Ore., Feb. 16, 2006 - Mentor Graphics Corporation (Nasdaq: MENT) today announced its mask data preparation tool suite, Calibre MDP, has been qualified for production at leading integrated device manufacturers (IDMs) for the 45 nanometer process technology in flows based on OASIS, the next generation stream format. This insures the IDMs' ability to efficiently manage the large data files needed to create a mask for integrated circuit production.

Calibre MDP was developed in response to the data explosion that occurred beginning with the 180nm node when IC production entered the deep submicron, or subwavelength era. At that time, it became mandatory for semiconductor manufacturers to apply resolution enhancement techniques to designs in order to achieve successful silicon. The resulting data files, which are "flattened" to accommodate the mask writer format specification, became so large that run times for mask writing lengthened to several days or weeks. This created a bottleneck that substantially increased costs and threatened the ability to meet the market window.

Calibre MDP reduces the bottleneck and speeds turn-around-time by reducing the size of data files, enhancing the performance and capacity of tools in the flow, unifying geometry processing and increasing processing efficiency. It supports all mask writer formats: MEBES, JEOL, Toshiba/NuFlare, Hitachi and Micronic.

Calibre's mask data preparation suite is an integrated part of the market-leading Calibre design-to-silicon platform that includes solutions for physical verification, parasitic extraction, design-for-manufacturing, and resolution enhancement. The Calibre platform is ready and proven for the 45nm node.

The Calibre mask synthesis flow will be demonstrated in the Mentor Graphics booth (#313) at the 2006 SPIE Microlithography conference, which takes place at the San Jose Convention Center, February 19- 24. Calibre OPCverify, the new advanced optical process correction verification solution, will also be demonstrated.

About Mentor Graphics
Mentor Graphics Corporation (Nasdaq: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world's most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of about $700 million and employs approximately 4,000 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777; Silicon Valley headquarters are located at 1001 Ridder Park Drive, San Jose, California 95131-2314. World Wide Web site: http://www.mentor.com/.

Calibre and Mentor Graphics are registered trademark of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.